Quantitative characterization of DNA films by X-ray photoelectron spectroscopy

被引:178
作者
Petrovykh, DY
Kimura-Suda, H
Tarlov, MJ
Whitman, LJ
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Univ Maryland, Dept Phys, College Pk, MD 20742 USA
[3] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
关键词
D O I
10.1021/la034944o
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We describe the use of self-assembled films of thiolated (dT)(25) single-stranded DNA (ssDNA) on gold as a model system for quantitative characterization of DNA films by X-ray photoelectron spectroscopy (XPS). We evaluate the applicability of a uniform and homogeneous overlayer-substrate model for data analysis, examine model parameters used to describe DNA films (e.g., density and electron attenuation length), and validate the results. The model is used to obtain quantitative composition and coverage information as a function of immobilization time. We find that when the electron attenuation effects are properly included in the XPS data analysis, excellent agreement is obtained with Fourier transform infrared (FTIR) measurements for relative values of the DNA coverage, and the calculated absolute coverage is consistent with a previous radiolabeling study. Based on the effectiveness of the analysis procedure for model (dT)25 ssDNA films, it should be generally valid for direct quantitative comparison of DNA films prepared under widely varying conditions.
引用
收藏
页码:429 / 440
页数:12
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