Preparation of Ti-Al gradient composite films by sputtering

被引：9

作者：

Takeda, F ^{[1
]}

Nakajima, T ^{[1
]}

机构：

[1] Toyama Natl Coll Technol, Toyama 939, Japan

来源：

THIN SOLID FILMS | 1998年 / 316卷 / 1-2期

关键词：

sputtering; solenoid coil; gradient composite; titanium aluminide;

D O I：

10.1016/S0040-6090(98)00391-5

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

Titanium aluminide thin films have been deposited on quartz plates by DC magnetron sputtering with a solenoid coil. A round shaped Ti and Al complex disk was employed as a target. In our sputtering system, because the spatial position of plasma on the target surface can be controlled by the solenoid coil current, the in-depth concentration profile of Ti and Al can be controlled by changing the solenoid coil current. Highly oriented Ti3Al, TiAl and TiAl3 films were synthesized from one complex Ti and Al target at 400 degrees C by changing the solenoid coil current. Gradient composite him of these titanium aluminides could also be fabricated by changing the solenoid coil current. (C) 1998 Elsevier Science S.A.

引用

页码：68 / 72

页数：5

共 4 条

[1]

NEW METHOD TO CONTROL COMPOSITION RATIO OF ALLOY-FILMS BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE [J].