NEW METHOD TO CONTROL COMPOSITION RATIO OF ALLOY-FILMS BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE

被引：15

作者：

HATA, T

KAMIDE, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574942

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2154 / 2158

页数：5

共 7 条

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[6] SILICIDE FORMATION IN THIN COSPUTTERED (TANTALUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2 [J].

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[7]

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