SILICIDE FORMATION IN THIN COSPUTTERED (TANTALUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2

被引：61

作者：

MURARKA, SP

FRASER, DB

机构：

[1] Bell Laboratories, Murray Hill, NJ 07974, United States

来源：

关键词：

D O I：

10.1063/1.327814

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1593 / 1598

页数：6

共 12 条

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[2] DEMPSEY J, 1979, 21ST EL MAT C BOULD
[3] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON
MURARKA, SP
FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 342 - 349
[4] SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2
MURARKA, SP
FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 350 - 356
[5] MURARKA SP, 1979, TECH DIGEST IEDM, P454
[6] MURARKA SP, UNPUBLISHED
[7] MURARKA SP, 1979, MAY IEEE VLSI WORKSH
[8] READ M, COMMUNICATION
[9] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM
READ, MH
HENSLER, DH
[J]. THIN SOLID FILMS, 1972, 10 (01) : 123 - &
[10] SCHOEN JM, UNPUBLISHED