Dependence of electrical properties of epitaxial Pb(Zr,Ti)O3 thick films on crystal orientation and Zr/(Zr+Ti) ratio -: art. no. 094106

被引:107
作者
Yokoyama, S
Honda, Y
Morioka, H
Okamoto, S
Funakubo, H
Iijima, T
Matsuda, H
Saito, K
Yamamoto, T
Okino, H
Sakata, O
Kimura, S
机构
[1] Tokyo Inst Technol, Dept Innovat & Engn Mat, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268502, Japan
[2] Natl Inst Adv Ind Sci & Technol, Res Inst Instrumentat Frontier, Tsukuba, Ibaraki 3058568, Japan
[3] Brujer AXS, Applicat Lab, Kanagawa Ku, Yokohama, Kanagawa 2210022, Japan
[4] Natl Def Acad, Dept Commun Engn, Yokosuka, Kanagawa 2398686, Japan
[5] Japan Synchrotron Radiat Res Inst, Spring 8, Div Sci Mat, Sayo, Hyogo 6795198, Japan
[6] Japan Sci & Technol Corp, Core Res Evolut Sci & Technol, Kawaguchi 3320012, Japan
关键词
D O I
10.1063/1.2126156
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial Pb(Zr,Ti)O-3(PZT) films, 1.5-2.0 mu m in thickness, with a Zr/(Zr+Ti) ratio ranging from 0.20 to 0.75 were grown on (100)(c)-,(110)(c)-, and (111)(c)-oriented SrRuO3//SrTiO3 substrates at 600 degrees C by metal-organic chemical vapor deposition (MOCVD). The effects the Zr/(Zr+Ti) ratio had on the crystal structure, dielectric and ferroelectric properties, and piezoelectric response of these films with different crystal orientations were systematically investigated. We ascertained from x-ray-diffraction reciprocal-space-mapping analysis that (001)(T)-/(100)(T)-/(100)(R)-,(101)(T)-/(110)(T)-/(110)(R)-/(10 (1) over bar)(R)-, and (111)(T)-/(111)(R)-/(11 (1) over bar)(R)-oriented films had epitaxially grown on the respective (100)(c)-,(110)(c)-, and (111)(c)-oriented SrRuO3//SrTiO3 substrates. The constituent phase changed from a tetragonal single phase, a mixture phase of a tetragonal and rhombohedral, to a rhombohedral single phase with increasing Zr/(Zr+Ti) ratio irrespective of the orientation of the substrates. However, the range of the Zr/(Zr+Ti) ratio of the film with the mixture phase differed depending on crystal orientation. This suggests that the stress relaxation process applied from the substrates changed due to crystal orientation. The relative dielectric constant was maximum for films with the mixture phase regardless of the crystal orientation. Remanent polarization was also maximum for these films on the (111)(c)SrRuO3//SrTiO3 substrates, while it was minimum on the (100)(c)- and (110)(c)-oriented SrRuO3//SrTiO3 substrates. Films with two phases coexisting had larger electric-field-induced strain than films with a single tetragonal or rhombohedral phase for the (111)-oriented films, but there were no remarkable changes in the (100)- and (110)-oriented films. Small ac signal measurements suggested that domain-wall motions easily occurred in the (111)-oriented films with the mixture phase compared with other orientations. These results indicated that the larger field-induced strain of the (111)-oriented PZT films consisting of a mixture of tetragonal and rhombohedral phases largely contributed to extrinsic factors such as domain-wall motions and phase transformation due to the applied electric field.
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