Prism - A tool for modelling proton energy deposition in semi-conductor materials

被引:10
作者
Oldfield, MK
Underwood, CI
机构
[1] UoSAT Satellite Engineering Research Group, University of Surrey, Surrey
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1109/23.556858
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a description of, and test results from, a new PC based software simulation tool PRISM (Protons In Semiconductor Materials). The model describes proton energy deposition in complex 3D ''sensitive volumes'' of semiconductor materials. PRISM is suitable for simulating energy deposition in surface-barrier detectors and semiconductor memory devices, the latter being susceptible to Single-Event Upset (SEU) and Multiple-Bit Upset (MBU). The design methodology on which PRISM is based, together with the techniques used to simulate ion transport and energy deposition, are described. Preliminary test results used to analyse the PRISM model are presented and the behavior of a payload on board a UoSAT class micro-satellite, simulated.
引用
收藏
页码:2715 / 2723
页数:9
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