Curve evolution models for real-time identification with application to plasma etching

被引：3

作者：

Berg, J ^{[1
]}

Yezzi, A

Tannenbaum, A

机构：

[1] Texas Tech Univ, Dept Mech Engn, Lubbock, TX 79409 USA

[2] Univ Minnesota, Dept Elect Engn, Minneapolis, MN 55455 USA

来源：

IEEE TRANSACTIONS ON AUTOMATIC CONTROL | 1999年 / 44卷 / 01期

基金：

美国国家科学基金会;

关键词：

curve evolution; level set methods; parameter estimation; plasma etching; process modeling; semiconductor manufacturing;

D O I：

10.1109/9.739081

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

It is desirable, in constructing an algorithm for real-time control or identification of free surfaces, to avoid representations of the surface requiring mesh refinement at corners or special logic for topological transitions. Level set methods provide a promising framework for such algorithms. In this paper we present: 1) A mathematical representation of free surface motion that is particularly well-suited to real-time implementation; 2) a technique for estimating an isotropic and homogeneous normal velocity based on a simple measurement; and 3) an application to a semiconductor etching problem.

引用

页码：99 / 102

页数：4

共 13 条

[1]

BERG JM, 1997, 1454 IMA

[2] DEVELOPMENT OF TECHNIQUES FOR REAL-TIME MONITORING AND CONTROL IN PLASMA-ETCHING .2. MULTIVARIABLE CONTROL-SYSTEM ANALYSIS OF MANIPULATED, MEASURED, AND PERFORMANCE VARIABLES [J].