In situ Raman monitoring of chromium oxide scale growth for stress determination

被引:69
作者
Mougin, J
Rosman, N
Lucazeau, G
Galerie, A
机构
[1] Univ Grenoble 1, INPG, CNRS, Lab Thermodynam & Physicochim Met,UMR 5614, F-38402 St Martin Dheres, France
[2] Univ Grenoble 1, INPG, CNRS,UMR 5631, Lab Electrochim & Physicochim Chim Mat & Interfac, F-38402 St Martin Dheres, France
关键词
D O I
10.1002/jrs.734
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Raman spectra of a growing chromia(Cr2O3) layer generated by oxidation of pure chromium at 730 degreesC under 150 mbar of oxygen were recorded in situ every 5 min. The wavenumber evolution of the main Raman band versus oxidation time was interpreted in terms of mechanical stress development. Comparison with Raman spectra of a fully relaxed spalled chromia layer submitted to high-pressure and high-temperature treatments showed that internal compressive stresses develop during the growth, varying from -2.1 GPa when the scale is very thin to -2.4 GPa when the scale reaches a thickness of 0.6 mum. Relaxation phenomena seem to take place during isothermal oxidation. During cooling, thermal stresses are induced, which are purely elastic according to the perfect reversibility of cooling-heating cycles. Copyright (C) 2001 John Wiley & Sons, Ltd.
引用
收藏
页码:739 / 744
页数:6
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