A novel high-accuracy microstereolithography method employing an adaptive electro-optic mask

被引：58

作者：

Farsari, M ^{[1
]}

Claret-Tournier, F ^{[1
]}

Huang, S ^{[1
]}

Chatwin, CR ^{[1
]}

Budgett, DM ^{[1
]}

Birch, PM ^{[1
]}

Young, RCD ^{[1
]}

Richardson, JD ^{[1
]}

机构：

[1] Univ Sussex, Sch Engn, Laser & Photon Syst Grp, Brighton BN1 9QT, E Sussex, England

来源：

JOURNAL OF MATERIALS PROCESSING TECHNOLOGY | 2000年 / 107卷 / 1-3期

基金：

英国工程与自然科学研究理事会;

关键词：

microstereolithography; rapid prototyping; spatial light modulators; diffractive optics;

D O I：

10.1016/S0924-0136(00)00672-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new stereo-photolithography technique to create three-dimensional micro-components using a planar, layer-by-layer, process of exposure has been developed. With this procedure, it is possible to build components with dimensions in the range 50 mum-50 mm, and feature sizes as small as 5 mum with a resolution of less than 1 mum. This newly developed system consists of eight elements: a Computer Aided Design environment supporting solid or surface modelling; a resin bath with an integrated high resolution translation stage and component built platform; an ultraviolet laser light source operating at 351.1 nm; an optical shutter; a diffractive optical element designed to re-distribute the irradiance of the laser beam from a Gaussian to a top-hat profile; a polysilicon thin film twisted nematic SVGA resolution (800 x 600) spatial light modulator; a multi-element lithographic reduction lens system; and a comprehensive control system. In this paper, the experimental set-up is described and examples of the microcomponents fabricated by the system are shown. (C) 2000 Published by Elsevier Science B.V.

引用

页码：167 / 172

页数：6

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