The kinetic behaviour of metals in water vapour at high temperatures: Can general rules be proposed?

被引：101

作者：

Galerie, A ^{[1
]}

Wouters, Y ^{[1
]}

Caillet, M ^{[1
]}

机构：

[1] Univ Grenoble 1, CNRS, UMR 5614, INPG,Lab Thermodynam & Physicochim Met, FR-38402 St Martin Dheres, France

来源：

HIGH TEMPERATURE CORROSION AND PROTECTION OF MATERIALS 5, PTS 1 AND 2 | 2001年 / 369-3卷

关键词：

hydroxyl ions; kinetics; oxidation mechanisms; semi-conducting properties; water vapour;

D O I：

10.4028/www.scientific.net/MSF.369-372.231

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The thermal oxidation of metals by water vapour and by oxygen is compared and several ideas are advanced to explain the differences often observed. The incorporation of hydroxyl ions in the oxide is shown to be of importance, but possible only if vacancy or interstitial oxide defects are present. The decomposition rate of H2O is another key-point and is shown to be correlated with the surface acidity of the oxide. Non-acidic p-type oxides could be very passive in water vapour whereas more acidic n-type oxides may oxidize at the same rate in both atmospheres or even more rapidly provided that rapid OH transport can take place within the formed scales.

引用

页码：231 / 238

页数：8

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