Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beams

被引：8

作者：

Nakai, H

Kuwahara, H

Shinohara, J

Kawaratani, T

Sassa, T

Ikegami, Y

机构：

[1] Research Institute, Ishikawajima-Harima Heavy Indust. C., Tokyo, 1-15 Toyosu 3-chome, Koto-ku

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 112卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)01428-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a new p-CVD process which incorporates accelerated ions in order to produce new functional materials which have multiple structures not available when using other processes. Aluminium oxide films deposited on the nickel based superalloy (INCONEL718) by p-CVD combined with simultaneous N-2(+) (accelerated to 10 keV) irradiation are polycrystalline and have very smooth surfaces and show superior adhesion compared to conventional plasma CVD layers.

引用

页码：280 / 283

页数：4

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