Influence of particle oxide coating on light scattering by submicron metal particles on silicon wafers

被引：54

作者：

Kim, JH

Ehrman, SH

Germer, TA

机构：

[1] Univ Maryland, Dept Chem Engn, College Pk, MD 20742 USA

[2] Natl Inst Stand & Technol, Opt Technol Div, Gaithersburg, MD 20899 USA

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 08期

关键词：

D O I：

10.1063/1.1650555

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the effect of room-temperature oxidation on scattering of 633 nm light by copper particles deposited on a silicon wafer. The results provide a validation for a theory of light scattering by coated particles on a substrate and establish the lifetime of these particles as light scattering standards to be on the order of a few months. The results also suggest that the room-temperature oxidation of copper particles proceeds in a continuous manner, rather than approaching an asymptotic thickness as found by Cabrera and Mott [Rep. Prog. Phys. 12, 163 (1948)] on copper films. (C) 2004 American Institute of Physics.

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页码：1278 / 1280

页数：3

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