Polarized light scattering by dielectric and metallic spheres on silicon wafers

被引:37
作者
Kim, JH [1 ]
Ehrman, SH
Mulholland, GW
Germer, TA
机构
[1] Natl Inst Stand & Technol, Div Opt Technol, Gaithersburg, MD 20899 USA
[2] Natl Inst Stand & Technol, Div Fire Res, Gaithersburg, MD 20899 USA
[3] Univ Maryland, Dept Chem Engn, College Pk, MD 20742 USA
关键词
D O I
10.1364/AO.41.005405
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The polarization and intensity of light scattered by monodisperse polystyrene latex and copper spheres, with diameters ranging from 92 to 218 nm, deposited on silicon substrates were measured with 442-, 532-, and 633-nm light. The results are compared with a theory for scattering by a sphere on a surface, originally developed by others [Physica A 137, 209 (1986)], and extended to include coatings on the sphere and the substrate. The results show that accurate calculation of the scattering of light by a metal sphere requires that the near-field interaction between the sphere and its image be included in a complete manner. The normal-incidence approximation does not suffice for this interaction, and the existence of any thin oxide layer on the substrate must be included in the calculation. (C) 2002 Optical Society of America.
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页码:5405 / 5412
页数:8
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