Data are presented demonstrating continuous 300 K photopumped InP quantum dot (QD) laser operation (656-679 nm) realized by modifying and coupling, via tunneling, an auxiliary InGaP quantum well (QW) to the QDs of an InP-In(AlGa)P-InAlP heterostructure grown by metalorganic chemical vapor deposition. The In0.49Ga0.51P QW coupled to the InP QDs by a thin (less than or similar to 20 Angstrom) In0.5Al0.3Ga0.2P barrier overcomes the limitations of carrier collection, lateral transport, and thermalization in the QDs, thus yielding a different form of QD laser. (C) 2001 American Institute of Physics.