Electronic characterization of defect sites on Si(001)-(2x1) by STM

被引:27
作者
Ukraintsev, VA [1 ]
Dohnalek, Z [1 ]
Yates, JT [1 ]
机构
[1] UNIV PITTSBURGH,CTR SURFACE SCI,DEPT CHEM,PITTSBURGH,PA 15260
关键词
low index single crystal surfaces; scanning tunneling microscopy; silicon; single crystal surfaces; surface electronic phenomena (work function; surface potential; surface states; etc.); surface relaxation and reconstruction; surface structure; morphology; roughness; and topography;
D O I
10.1016/S0039-6028(97)00384-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A study of the defect sites on Si(001)-(2 x 1) was undertaken by employing comparative scanning tunneling spectroscopy (CSTS). Ni induced defects, the A, B, and C defects, and the A and B steps were studied. The STM tip induced band bending significantly affects tunneling spectra. This is evident from a comparison of LDOS and local surface potentials obtained for high (10 Omega cm) and low (100 Omega cm) doped Si(001) crystals. Decay in the local surface potential was found around the Ni induced ''split off dimer'' defect site and in the ''vacancy channel'' defect. In agreement with previous studies, a reduction in the surface states energy gap was observed for the C defect. The B step and the C terrace defect reveal similar LDOS. This is interpreted as indicating that the C defect on the terraces migrates preferentially to the B step edge, and that it is due to a surface impurity such as Cl or a product of H2O decomposition. This may be responsible for preferential etching phenomena or evaporation at step edges. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:132 / 140
页数:9
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