Shape and Feature Size Control of Colloidal Crystal-Based Patterns Using Stretched Polydimethylsiloxane Replica Molds

被引：23

作者：

Choi, Hong Kyoon ^{[1
]}

Im, Sang Hyuk ^{[2
]}

Park, O. Ok ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem & Biomol Engn, Grad Program BK21, Taejon 305701, South Korea

[2] Korea Res Inst Chem Technol, Adv Mat Div, EPFL, Global Res Lab, Taejon 305600, South Korea

来源：

LANGMUIR | 2009年 / 25卷 / 20期

关键词：

NANOIMPRINT LITHOGRAPHY; PLASTIC ELECTRONICS; FABRICATION; ARRAYS; POLY(DIMETHYLSILOXANE); CHIP;

D O I：

10.1021/la902982y

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In this work, we fabricated various patterns using colloidal crystals as master molds via the soft lithography method. Even though colloidal crystals consist of spherical colloidal particles, nonspherical shaped patterns such as rectangular or elongated hexagonal shaped patterns can be fabricated using a stretched polydimethylsiloxane (PDMS) replica mold. The pattern shape and feature size can be easily controlled by changing the stretching axis and ratio of the PDMS replica mold. The deformations of the PDMS mold were Simulated using the finite element method, and they are consistent with experimental results. The elongated patterns were used as templates to offer new types of colloidal crystal superlattice structures. A proposed pattern-control method will significantly expand the usefulness and diversity of micro/nanopatterning technology.

引用

页码：12011 / 12014

页数：4

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