A laser-cooled atom beam for nanolithography applications

被引:18
作者
Camposeo, A [1 ]
Cervelli, F [1 ]
Piombini, A [1 ]
Tantussi, F [1 ]
Fuso, F [1 ]
Allegrini, M [1 ]
Arimondo, E [1 ]
机构
[1] Univ Pisa, Dipartimento Fis Enrico Fermi, INFM, I-56127 Pisa, Italy
来源
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS | 2003年 / 23卷 / 1-2期
关键词
atom lithography; nanofabrication; laser-cooling; laser manipulation;
D O I
10.1016/S0928-4931(02)00270-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We are developing an apparatus for atom lithography with the main objective of to push the space resolution of the technique towards its ultimate limit, expected in the 10 nm range. We exploit an original implementation of laser-cooling techniques to produce a brilliant and collimated cesium beam with low longitudinal velocity. Beam characterization, carried out with a variety of spectroscopic techniques, demonstrates the compatibility of the system with the strict requirements of nanolithography experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:217 / 220
页数:4
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