Photochemical oxidation of hydrogenated boron-doped diamond surfaces

被引:93
作者
Boukherroub, R
Wallart, X
Szunerits, S
Marcus, B
Bouvier, P
Mermoux, M
机构
[1] IEMN, CNRS 8520, F-59652 Villeneuve Dascq, France
[2] UJF, INPG, LEPMI, F-38402 St Martin Dheres, France
关键词
boron-doped polycrystalline diamond; photochemical oxidation; electrochemical properties; surface chemical reactivity;
D O I
10.1016/j.elecom.2005.05.010
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We describe the photochemical oxidation of polycrystalline boron-doped diamond films by UV irradiation in air at room temperature. The reaction generates surface hydroxyl groups that have been coupled with perfluorodecyl trichlorosilane to yield an organic layer covalently attached to the diamond surface. The resulting surfaces were characterized using X-ray photoelectron spectroscopy, contact angle and cyclic voltammetry. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:937 / 940
页数:4
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