Studies of film growth processes and surface structural characterization of ferroelectric memory-compatible SrBi2Ta2O9 layered perovskites via in situ, real-time ion-beam analysis

被引:28
作者
Auciello, O
Krauss, AR
Im, J
Gruen, DM
Irene, EA
Chang, RPH
McGuire, GE
机构
[1] ARGONNE NATL LAB,DIV CHEM,ARGONNE,IL 60439
[2] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27599
[3] NORTHWESTERN UNIV,DEPT MAT SCI,EVANSTON,IL 60208
[4] MICROELECT CTR N CAROLINA,ELECT TECHNOL DIV,RES TRIANGLE PK,NC 27709
关键词
D O I
10.1063/1.117554
中图分类号
O59 [应用物理学];
学科分类号
摘要
In situ, real-time studies of layered perovskite SrBi2Ta2O9 (SBT) film growth processes were performed using a time-of-flight ion scattering and recoil spectroscopy (TOF ISARS) technique. These studies revealed two important features related to the synthesis of SET films via ion-beam sputter-deposition, namely: (a) atomic oxygen originating from a multicomponent SET target during the sputtering process is incorporated in the growing film more efficiently than molecular oxygen; and (b) the SET surface appears to be terminated in an incomplete (Bi2O2)(2+) layer with a top surface of oxygen atoms, which may be responsible for the high resistance to polarization fatigue exhibited by Pt/SBT/Pt capacitors. (C) 1996 American Institute of Physics.
引用
收藏
页码:2671 / 2673
页数:3
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