Surface potential studies using Kelvin force spectroscopy

被引:15
作者
Lu, J
Guggisberg, M
Luthi, R
Kubon, M
Scandella, L
Gerber, C
Meyer, E
Guntherodt, HJ
机构
[1] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland
[2] IBM Res Ctr Zurich, Zurich, Switzerland
[3] Paul Scherrer Inst, Villigen, Switzerland
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / Suppl 1期
关键词
D O I
10.1007/s003390051144
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A home-built Kelvin force microscope combined with a spectroscopic method is dedicated to local measurements of topography and contact potential differences (CPD). This technique is based on a simple modification of a noncontact atomic force microscopy (nc-AFM), where a bias voltage is applied between the sample and tip during the CPD measurement. The changes in CPD between the tip and various sample materials have been measured. Kelvin force spectra of Pd/Si and of self-assembling monolayer films (SAMs) are presented.
引用
收藏
页码:S273 / S275
页数:3
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