A chemical vapour deposition route to MoO3-Bi2O3 thin films

被引：23

作者：

Barreca, D ^{[1
]}

Rizzi, GA ^{[1
]}

Tondello, E ^{[1
]}

机构：

[1] Univ Padua, Dipartimento Chim Inorgan Met Organ & Analit, CNR, Ctr Studio Stabilita & Reattivita Composti Coordi, I-35131 Padua, Italy

来源：

THIN SOLID FILMS | 1998年 / 333卷 / 1-2期

关键词：

bismuth oxide; molybdenum oxide; bismuth molybdates; thin films; chemical vapour deposition;

D O I：

10.1016/S0040-6090(98)00800-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

MoO(3)-Bi(2)O(3) thin films are grown by CVD on SiO(2)/Si(100) and Al(2)O(3) using BiPh(3) and MoO(2)(dpm)(2) as precursors. The composition, microstructure and morphology of the samples can be suitably controlled by the proper combination of synthesis and thermal treatment conditions. The chemical characterization of the obtained films is carried out by XPS and FTIR, while the microstructure and surface morphology are investigated respectively by XRD and AFM. Preliminary measurements on Bi-doped MoO(3) films indicate that they could be used for the detection of scarcely reducing gases. (C) Published by 1998 Elsevier Science S.A. All rights reserved.

引用

页码：35 / 40

页数：6

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