Characterization and gas-sensing behavior of an iron oxide thin film prepared by atomic layer deposition

被引:72
作者
Aronniemi, Mikko [1 ]
Saino, J. [1 ]
Lahtinen, J. [1 ]
机构
[1] Helsinki Univ Technol, Phys Lab, FI-02015 Helsinki, Finland
关键词
iron oxide; thin film; gas sensor; atomic layer deposition; atomic force microscopy;
D O I
10.1016/j.tsf.2007.11.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work we investigate an iron oxide thin film grown with atomic layer deposition for a gas sensor application. The objective is to characterize the structural, chemical, and electrical properties of the film, and to demonstrate its gas-sensitivity. The obtained scanning electron microscopy and atomic force microscopy results indicate that the film has a granular structure and that it has grown mainly on the glass substrate leaving the platinum electrodes uncovered. X-ray diffraction results show that iron oxide is in the alpha-Fe2O3 (hematite) phase. X-ray photoelectron spectra recorded at elevated temperature imply that the surface iron is mainly in the Fe3+ state and that oxygen has two chemical states: one corresponding to the lattice oxygen and the other to adsorbed oxygen species. Electric conductivity has an activation energy of 0.3-0.5 eV and almost Ohmic current-voltage dependency. When exposed to O-2 and CO, a typical n-type response is observed. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:6110 / 6115
页数:6
相关论文
共 47 条
[1]   GRANULAR FILMS OF IRON-OXIDE PREPARED BY AEROSOL DEPOSITION FOR THE DETECTION OF ORGANIC VAPORS [J].
ALTHAINZ, P ;
SCHUY, L ;
GOSCHNICK, J ;
ACHE, HJ .
THIN SOLID FILMS, 1994, 241 (1-2) :366-369
[2]   Chemical state quantification of iron and chromium oxides using XPS: the effect of the background subtraction method [J].
Aronniemi, M ;
Sainio, J ;
Lahtinen, J .
SURFACE SCIENCE, 2005, 578 (1-3) :108-123
[3]   Characterization of iron oxide thin films [J].
Aronniemi, M ;
Lahtinen, J ;
Hautojärvi, P .
SURFACE AND INTERFACE ANALYSIS, 2004, 36 (08) :1004-1006
[4]   Conduction model of metal oxide gas sensors [J].
Barsan, N ;
Weimar, U .
JOURNAL OF ELECTROCERAMICS, 2001, 7 (03) :143-167
[5]   PHOTOELECTROLYSIS WITH YFEO3 ELECTRODES [J].
BUTLER, MA ;
GINLEY, DS ;
EIBSCHUTZ, M .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (07) :3070-3072
[6]   Characterization of alpha-Fe2O3 thin films deposited by atmospheric pressure CVD onto alumina substrates [J].
Chai, CC ;
Peng, J ;
Yan, BP .
SENSORS AND ACTUATORS B-CHEMICAL, 1996, 34 (1-3) :412-416
[7]   CHARACTERISTICS OF ALPHA-FE2O3 THICK-FILM GAS SENSORS [J].
CHUNG, WY ;
LEE, DD .
THIN SOLID FILMS, 1991, 200 (02) :329-339
[8]   CO sensing properties of titanium and iron oxide nanosized thin films [J].
Comini, E ;
Guidi, V ;
Frigeri, C ;
Riccò, I ;
Sberveglieri, G .
SENSORS AND ACTUATORS B-CHEMICAL, 2001, 77 (1-2) :16-21
[9]   Growth of iron oxide on yttria-stabilized zirconia by atomic layer deposition [J].
de Ridder, M ;
van de Ven, PC ;
van Welzenis, RG ;
Brongersma, HH ;
Helfensteyn, S ;
Creemers, C ;
Van Der Voort, P ;
Baltes, M ;
Mathieu, M ;
Vansant, EF .
JOURNAL OF PHYSICAL CHEMISTRY B, 2002, 106 (51) :13146-13153
[10]   In situ XPS analysis of various iron oxide films grown by NO2-assisted molecular-beam epitaxy [J].
Fujii, T ;
de Groot, FMF ;
Sawatzky, GA ;
Voogt, FC ;
Hibma, T ;
Okada, K .
PHYSICAL REVIEW B, 1999, 59 (04) :3195-3202