Atomic layer deposition in traveling-wave reactor: In situ diagnostics by optical reflection

被引：27

作者：

Rosental, A

Adamson, P

Gerst, A

Koppel, H

Tarre, A

机构：

[1] Institute of Physics, EE-2400 Tartu

来源：

APPLIED SURFACE SCIENCE | 1997年 / 112卷

关键词：

atomic layer deposition; traveling-wave reactor; in situ diagnostics; optical reflection; TiO2 thin films;

D O I：

10.1016/S0169-4332(96)01003-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The traveling-wave reactor is an effective instrument for performing atomic layer deposition (ALD). In this paper, the use of a Brewster-angle interferometric reflectance technique for in situ real-time monitoring of ALD growth of transparent thin films on transparent and non-transparent substrates in suited traveling-wave reactors is proposed and analyzed on the basis of a classical four-phase approximation. An appropriate experimental reactor system is described. The technique is applied to the diagnostics of TiO2 growth from TiCl4 and H2O. Features of the reflectance signal in the conditions of time-homogeneous ALD growth are discussed.

引用

页码：82 / 86

页数：5

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