Film Deposition in the Dielectric Barrier Discharge at Atmospheric Pressure in He/O2/HMDSO and He/N2O/HMDSO mixtures

被引：22

作者：

Vinogradov, Igor ^{[1
]}

Lunk, Achim ^{[1
]}

机构：

[1] Univ Stuttgart, Inst Plasmaforsch, D-70569 Stuttgart, Germany

来源：

PLASMA PROCESSES AND POLYMERS | 2009年 / 6卷

关键词：

deposition rate; dielectric barrier discharge (DBD); FTIR-absorption spectroscopy; optical emission spectroscopy; plasma polymerization; XPS; PLASMA; PECVD;

D O I：

10.1002/ppap.200931102

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Non-thermal dielectric barrier discharges (DBD) operated in a parallel plate reactor (6 cm width and 1.6 cm long) under atmospheric pressure in He/O-2/HAADSO and He/N2O/HMDSO mixtures at different O-2 or N2O to HMDSO (hexamethyldisiloxane) ratios and different power are studied. The effective power of the discharge was derived by evaluating the Lissajous-figure on the oscilloscope. Emission spectroscopy and FTIR-absorption spectroscopy were applied to get information on the reaction products in DBD. The spectroscopic gas analysis was performed at three residence times. The properties of the polymer films deposited on silicon wafers were measured by FTIR-absorption spectroscopy, AFM and XPS analysis. Surface tension was obtained by contact angle measurements with water. Correlations between parameters of plasma phase with film parameters are discussed.

引用

页码：S514 / S518

页数：5

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