Penning type magnetron sputtering source and its use in the production of carbon nitride coatings

This article describes the design and construction of a Penning type sputter magnetron which is referred to as the Dimag source. This device is capable of producing intense discharges at pressures well below those obtainable using a conventional magnetron source. Expressions used to describe the associated magnetic field are highlighted. An account of the effective potential well as seen by charged species within the plasma is given. Various operational parameters are described. The device is used to produce carbon nitride coatings with high atomic percent nitrogen incorporation. (C) 1999 American Vacuum Society. [S0734-2101(99)05001-0].