HIGH-RATE DEPOSITION OF PERMALLOY-FILMS BY 2 FACING TARGETS TYPE OF SPUTTERING

被引：13

作者：

HOSHI, Y

KOJIMA, M

NAOE, M

YAMANAKA, S

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1982年 / 18卷 / 06期

关键词：

D O I：

10.1109/TMAG.1982.1061970

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

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页码：1433 / 1435

页数：3

相关论文

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[J]. IEEE TRANSACTIONS ON MAGNETICS, 1981, 17 (06) : 3175 - 3177
[5] FACING TARGETS TYPE OF SPUTTERING METHOD FOR DEPOSITION OF MAGNETIC METAL-FILMS AT LOW-TEMPERATURE AND HIGH-RATE
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[J]. IEEE TRANSACTIONS ON MAGNETICS, 1980, 16 (05) : 646 - 648