Neuronal cell loss accompanies the brain tissue response to chronically implanted silicon microelectrode arrays

被引:661
作者
Biran, R
Martin, DC
Tresco, PA
机构
[1] Univ Utah, Dept Bioengn, Keck Ctr Tissue Engn, Salt Lake City, UT 84112 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Macromol Sci & Engn Ctr, Ann Arbor, MI 48109 USA
关键词
brain tissue; implantation; silicon; neuroinflammation; neurotoxicity;
D O I
10.1016/j.expneurol.2005.04.020
中图分类号
Q189 [神经科学];
学科分类号
071006 ;
摘要
Implantable silicon microelectrode array technology is a useful technique for obtaining high-density, high-spatial resolution sampling of neuronal activity within the brain and holds promise for a wide range of neuroprosthetic applications. One of the limitations of the current technology is inconsistent performance in long-term applications. Although the brain tissue response is believed to be a major cause of performance degradation, the precise mechanisms that lead to failure of recordings are unknown. We observed persistent ED1 immunoreactivity around implanted silicon microelectrode arrays implanted in adult rat conex that was accompanied by a significant reduction in nerve fiber density and nerve cell bodies in the tissue immediately surrounding the implanted silicon microelectrode arrays. Persistent ED1 up-regulation and neuronal loss was not observed in microelectrode stab controls indicating that the phenotype did not result from the initial mechanical trauma of electrode implantation, but was associated with the foreign body response. In addition, we found that explanted electrodes were covered with ED1/MAC-1 immunoreactive cells and that the cells released MCP-1 and TNF-alpha under serum-free conditions in vitro. Our findings suggest a potential new mechanism for chronic recording failure that involves neuronal cell loss, which we speculate is caused by chronic inflammation at the microelectrode brain tissue interface. (c) 2005 Published by Elsevier Inc.
引用
收藏
页码:115 / 126
页数:12
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