High-rate epitaxy of anatase films by atmospheric chemical vapor deposition

被引:42
作者
Tokita, S
Tanaka, N
Saitoh, H
机构
[1] Kousei Co, Niigata 9591256, Japan
[2] Environm Sci Res Niigata, Niigata 9590291, Japan
[3] Nagaoka Univ Technol, Nagaoka, Niigata 9402188, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2000年 / 39卷 / 2B期
关键词
epitaxy; CVD; anatase; film; orientation; sapphire; MgO; SrTiO3; SEM; XRD;
D O I
10.1143/JJAP.39.L169
中图分类号
O59 [应用物理学];
学科分类号
摘要
Crystalline orientation often provides particularly the anisotropy of chemical and physical properties. Since the epitaxial films are composed of highly oriented crystals, it is expected that chemical and physical advantages are predominantly in one specific direction. In this study, high-rate epitaxy of anatase films was attempted using a chemical-vapor-deposition technique. Four types of epitaxial anatase films were obtained, i.e., (112), (110), (100) and (001) oriented normal to the substrate surface. These films reduced methylene blue under ultraviolet irradiation. The reduction rate of methylene blue was largely affected in the direction of crystalline orientation.
引用
收藏
页码:L169 / L171
页数:3
相关论文
共 5 条
[1]  
CHEM S, 1993, J VAC SCI TECHNOL A, V11, P2419
[2]   EPITAXIAL SUPERCONDUCTING THIN-FILMS OF YBA2CU3O7-X ON KTAO3 SINGLE-CRYSTALS [J].
FEENSTRA, R ;
BOATNER, LA ;
BUDAI, JD ;
CHRISTEN, DK ;
GALLOWAY, MD ;
POKER, DB .
APPLIED PHYSICS LETTERS, 1989, 54 (11) :1063-1065
[3]   Ultraviolet excitonic laser action at room temperature in ZnO nanocrystalline epitaxial films [J].
Kawasaki, M ;
Ohtomo, A ;
Koinuma, H ;
Sakurai, Y ;
Yoshida, Y ;
Tang, ZK ;
Yu, P ;
Wang, GKL ;
Segawa, Y .
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 :1459-1462
[4]   Epitaxial growth mechanism of chemical-vapor-deposited anatase on strontium titanate substrate [J].
Saitoh, H ;
Sunayama, H ;
Tanaka, N ;
Ohshio, S .
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1998, 106 (11) :1051-1055
[5]   Preferential orientation of titanium dioxide polycrystalline films using atmospheric CVD technique [J].
Tanaka, N ;
Ohshio, S ;
Saitoh, H .
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1997, 105 (07) :551-554