Epitaxial growth and characterization of Eu0.5Sr0.5CoO3 thin films by off-axis sputtering

被引:6
作者
Kwon, Daeyoung [1 ,2 ]
Wu, Youngsu [1 ,2 ]
Kim, Bongju [1 ,2 ]
Kim, Bog G. [1 ,2 ,3 ]
Hwang, Harold Y. [3 ,4 ]
机构
[1] Pusan Natl Univ, Dept Phys, Pusan 609735, South Korea
[2] Pusan Natl Univ, Res Ctr Dielect & Adv Matter Phys, Pusan 609735, South Korea
[3] Univ Tokyo, Dept Adv Mat Sci, Chiba 2778561, Japan
[4] Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, Japan
关键词
OXIDE; LA1-XSRXCOO3-DELTA; MAGNETORESISTANCE; HETEROSTRUCTURES;
D O I
10.1063/1.3234372
中图分类号
O59 [应用物理学];
学科分类号
070305 [高分子化学与物理];
摘要
We report the epitaxial growth and physical properties of Eu0.5Sr0.5CoO3 (ESCO) thin films deposited on (001) LaAlO3 (LAO) and (001) SrTiO3 (STO) substrates by off-axis rf sputtering. The magnetic properties of a grown film are governed by the crystallinity of the thin film and strain effects due to the substrate. The temperature-dependent resistivity of an optimized ESCO thin film on a LAO substrate shows a characteristic sudden decrease near the ferromagnetic transition temperature, indicating metallic double-exchange-like behavior, while the resistivity of ESCO on a STO substrate displays insulatinglike behavior because of substrate strain. These results suggest that optimized ESCO film on LAO is ideal as a bottom electrode for strained dielectric and ferroelectric heterostructures. (C) 2009 American Institute of Physics. [doi:10.1063/1.3234372]
引用
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页数:3
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