The stochastic stabilized Kuramoto-Sivashinsky equation: a model for compact electrodeposition growth

We report on numerical studies of the dynamical behavior of a stochastic version of the stabilized Kuramoto-Shivashinsky equation, in 1 + 1 dimensions, at short times and small length scales. The solution evolves as a rough growing interface, showing a well defined growth exponent beta = 0.37+/-0.04 and a roughness exponent that saturates at a value alpha = 0.80+/-0.04. A morphological instability may also develop for certain values of the control parameter and with a well-defined characteristic length. The resulting dynamical scenario and scaling properties compare fairly well with experimental results on slow compact electrodeposition growth. (C) 1997 Elsevier Science B.V.