Thermoelastic stress-induced thin film martensites

被引：24

作者：

Craciunescu, C ^{[1
]}

Li, H ^{[1
]}

Wuttig, M ^{[1
]}

机构：

[1] Univ Maryland, Dept Mat & Nucl Engn, College Pk, MD 20742 USA

来源：

SCRIPTA MATERIALIA | 2003年 / 48卷 / 01期

基金：

美国国家科学基金会;

关键词：

NiTi; thin films; martensitic transformation; martensitic; R-phase; thermoelastic stress;

D O I：

10.1016/S1359-6462(02)00347-0

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

It is shown that thermoelastic stresses control the transformation sequences in shape memory alloy films deposited on heated silicon cantilever-type substrates. An R-phase transition occurs in Ni-rich NiTi films deposited on substrates heated to 250 degreesC. For deposition temperatures higher than 350 degreesC only a B19' type transition is observed. (C) 2003 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：65 / 70

页数：6

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