Mechanical properties of Ti-Ni shape memory thin films formed by sputtering

被引：59

作者：

Ishida, A

Sato, M

Miyazaki, S

机构：

[1] Natl Res Inst Met, Tsukuba, Ibaraki 305, Japan

[2] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 305, Japan

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1999年 / 273卷

关键词：

Ti-Ni; shape memory; sputtering; micromachine; stress-strain curve; thin film;

D O I：

10.1016/S0921-5093(99)00410-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The stress-strain curves of Ti-48.3, 50.0, 51.5at.%Ni thin films were measured. The results showed that sputter-deposited thin films possess sufficient ductility and strength for practical use. Particularly it was noted that a Ti-48.3at.%Ni thin film annealed at 773 K for 300 s shows a large elongation of 20% contrary to bulk specimens. However, the ductility of Ti-48.3at.%Ni thin films was found to be very sensitive to annealing conditions. Ti-48.3at.%Ni thin films annealed at 873 K for 3.6 ks do not show any ductility. The difference in the ductility of the Ti-48.3at.%Ni thin films can be explained by grain-boundary precipitates of Ti2Ni. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：754 / 757

页数：4

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