Growth of well-aligned carbon nanotubes on a large area of Co-Ni co-deposited silicon oxide substrate by thermal chemical vapor deposition

被引:56
作者
Lee, CJ [1 ]
Park, J
Kang, SY
Lee, JH
机构
[1] Kunsan Natl Univ, Sch Elect Engn, Kunsan 573701, South Korea
[2] Korea Univ, Dept Chem, Jochiwon 339700, South Korea
[3] ETRI, Microelect Labs, Next Semicond Res Dept, Taejon 305350, South Korea
关键词
D O I
10.1016/S0009-2614(00)00521-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have grown vertically well-aligned multiwalled carbon nanotubes (CNT) on a large area of cobalt-nickel (Co-Ni) co-deposited silicon oxide substrate by thermal chemical vapor deposition using C2H2 gas, at 950 degrees C. The diameter of CNTs is in the range of 50-120 nm and the length is about 130 mu m. The grown CNTs have a bamboo structure and closed tip with no catalytic particles inside. As the particle size of Co-Ni catalyst decreases, the vertical alignment is enhanced. The CNTs exhibits a low turn-on voltage of 0.8 V/mu m with an emission current density of 0.1 mu A cm(-2). (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:554 / 559
页数:6
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