Properties of diamond-like carbon films fabricated by the filtered cathodic vacuum arc method

被引：8

作者：

Inaba, H

Fujimaki, S

Sasaki, S

Hirano, S

Todoroki, S

Furusawa, K

Yamasaka, M

Shi, X

机构：

[1] Hitachi Ltd, Prod Engn Res Lab, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan

[2] Hitachi Ltd, Data Storage Syst Div, Odawara, Kanagawa 25968510, Japan

[3] Nanofilm Technol Int Pte Ltd, Singapore, Singapore

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2002年 / 41卷 / 09期

关键词：

diamond-like carbon; tetrahedral amorphous carbon; filtered cathodic vacuum arc; ion; plasma;

D O I：

10.1143/JJAP.41.5730

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

With the aim of evaluating the properties of diamond-like carbon (DLC) films. a comparison is made between tetrahedral amorphous carbon (ta-C) films fabricated by the double-bend-filtered cathodic vacuum arc FCVA method using no material gas and hydrogenerated amorphous carbon (a-C:H) films fabricated by the chemical vapor deposition (CVD) method using a hydrocarbon gas. It was found that the ta-C films are superior to the a-C:II films in terms of both wear resistance and combustion resistance. It was also determined that this superiority applies for ultra thin films as well.

引用

页码：5730 / 5733

页数：4

共 10 条

[1] Control of plasma parameters for high-quality hydrogenated amorphous carbon growth [J].