Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution

被引：88

作者：

Hellwig, O. ^{[1
]}

Bosworth, J. K. ^{[1
]}

Dobisz, E. ^{[1
]}

Kercher, D. ^{[1
]}

Hauet, T. ^{[1
]}

Zeltzer, G. ^{[1
]}

Risner-Jamtgaard, J. D. ^{[1
]}

Yaney, D. ^{[1
]}

Ruiz, R. ^{[1
]}

机构：

[1] Hitachi Global Storage Technol, San Jose Res Ctr, San Jose, CA 95135 USA

来源：

APPLIED PHYSICS LETTERS | 2010年 / 96卷 / 05期

关键词：

electron beam lithography; magnetic domains; magnetic recording; magnetic switching; polymer blends; self-assembly; synchronisation; LITHOGRAPHY; ANISOTROPY; FILMS;

D O I：

10.1063/1.3293301

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specifications required for write synchronization in bit patterned media magnetic recording systems. In our study, we show that this approach also yields a narrower magnetic switching field distribution (SFD) than e-beam patterning or block copolymer self-assembly alone. We demonstrate that the pattern uniformity, i.e., island diameter and placement distributions are also important for achieving tight magnetic SFDs.

引用

页数：3

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