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Interaction of gaseous H atoms with Cu(100) surfaces:: adsorption, absorption, and abstraction
被引:38
作者:
Kolovos-Vellianitis, D
Kammler, T
Küppers, J
机构:
[1] Univ Bayreuth, D-95440 Bayreuth, Germany
[2] Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany
关键词:
Auger electron spectroscopy;
copper;
deuterium;
hydrogen atom;
low energy electron diffraction (LEED);
surface chemical reaction;
thermal desorption spectroscopy;
D O I:
10.1016/S0039-6028(00)00220-X
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The interaction of H atoms with clean and D-covered Cu(100) surfaces was studied with LEED, TPD and direct product detection methods. H(D) exposure of Cu(100) surfaces leads to a p(2 x 2) reconstruction and adsorbed and absorbed species. Absorbed H(D) desorbs via recombination between 150 and 200 It according to a zero order rate law with 0.35 eV activation energy. Adsorbed species desorb via second order between 200 and 350 K. Abstraction of D by gaseous H at 80 K leads to HD and D, formation, with 1% of the adsorbed D occurring in homonuclear products. These and the HD kinetics contradict the operation of an Eley-Rideal mechanism, but are in accordance with the operation of a hot-atom mechanism. Absorbed D is not abstracted. The D abstraction kinetics exhibit significant differences from that measured on Cu(111) surfaces and suggest that abstraction is sensitive to the surface structure of a substrate. (C) 2000 Elsevier Science B.V. All rights reserved.
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页码:316 / 319
页数:4
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