Evaluation of the crystal structure, film properties, and Bs of electroplated CoNiFe films

被引:15
作者
Saito, M [1 ]
Ishiwata, N
Ohashi, K
机构
[1] NEC Corp Ltd, Funct Devices Res Labs, Tokyo 1838501, Japan
[2] Fundamental Res Labs, Tokyo 1838501, Japan
关键词
D O I
10.1149/1.1518483
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The factors which affect the saturation magnetic flux density (B-s) of electroplated CoNiFe films were investigated and the results are reported. The Fe composition, the ratio of body-centered cubic (110) to face-centered cubic (111) peak intensity (R-b), and the density were found to affect the B-s of the films. The B-s increased when the R-b, Fe composition, and the density were increased; we found that a larger grain size and fewer impurities produced a higher density film. It was determined that the suppression of the impurities and the increased grain size led to the high film density and high B-s. (C) 2002 The Electrochemical Society.
引用
收藏
页码:C642 / C647
页数:6
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