Phase transformation of A15 crystal structure chromium thin films grown by the sputter deposition

被引:18
作者
Chu, JP
Chang, JW
Lee, PY
机构
[1] Institute of Materials Engineering, National Taiwan Ocean University
关键词
chromium thin films; A15 crystal structure; phase transformation; RF magnetron sputtering;
D O I
10.1016/S0254-0584(97)80180-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Phase transformation of non-BCC delta-A15 Cr thin films prepared by r.f. magnetron sputtering has been characterized. Using differential scanning calorimetry (DSC), we demonstrated for the first time that the phase transformation of the delta-A15 Cr phase to the equilibrium alpha-BCC Cr phase is an irreversible, exothermic, first-order transition. At a heating rate of 10 degrees C min(-1), the onset and peak temperatures of transformation were determined to be 428 and 437 degrees C, respectively. The enthalpy change of the transformation, Delta H, was estimated to be in a range from -6 to -12 kJ mol(-1). The uncertainty of Delta H was attributed to an ill-defined transition completion temperature and an incorporation of substrate material into the DSC him samples analyzed. Our in situ DSC results confirmed the metastable and allotropic nature of delta-A15 Cr phase, which has been proposed by other prior studies using conventional ex situ X-ray and electron diffraction methods. Our X-ray photoelectron spectroscopy analyses on as-deposited and annealed films showed that while the chrome oxides or carbides were formed inevitably in annealed films the Cr and O were mostly in the unbound states. Hence, it is unlikely that the delta-A15 Cr phase is of an oxide phase.
引用
收藏
页码:31 / 36
页数:6
相关论文
共 32 条
[1]   TUNGSTEN FILMS WITH THE A15 STRUCTURE [J].
ARITA, M ;
NISHIDA, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (04) :1759-1764
[2]   ON THE RELATIONS BETWEEN THE DELTA-CR AND ALPHA-CR PHASES [J].
BIRJEGA, MI ;
POPESCUPOGRION, N .
THIN SOLID FILMS, 1989, 171 (01) :33-41
[3]   PARTICULARITIES IN THE GROWTH-BEHAVIOR OF VACUUM-EVAPORATED CHROMIUM THIN-FILMS [J].
BIRJEGA, MI ;
POPESCUPOGRION, N ;
SARBU, C ;
TOPA, V .
THIN SOLID FILMS, 1979, 58 (01) :217-221
[4]  
CHU JP, UNPUB THIN SOLIDS FI
[5]   VACUUM-EVAPORATED FILMS OF CHROMIUM WITH A-15 STRUCTURE [J].
DOHERTY, CJ ;
POATE, JM ;
VOORHOEVE, RJH .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (05) :2050-2054
[6]  
ELESKANDARANY MS, 1992, J APPL PHYS, V72, P2665
[7]   FORMATION OF AMORPHOUS ALUMINUM TANTALUM NITRIDE POWDERS BY MECHANICAL ALLOYING [J].
ELESKANDARANY, MS ;
AOKI, K ;
SUZUKI, K .
APPLIED PHYSICS LETTERS, 1992, 60 (13) :1562-1563
[8]   MORPHOLOGICAL AND CALORIMETRIC STUDIES ON THE AMORPHIZATION PROCESS OF ROD-MILLED AL50ZR50 ALLOY POWDERS [J].
ELESKANDARANY, MS ;
AOKI, K ;
SUZUKI, K .
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1992, 23 (08) :2131-2140
[9]   GROWTH AND STRUCTURE OF THIN CHROMIUM FILMS CONDENSED ON ULTRA-HIGH VACUUM CLEAVED NACL AND KCL CRYSTALS [J].
FORSSELL, J ;
PERSSON, B .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1970, 29 (06) :1532-&
[10]   INTERPRETATION OF DIFFRACTION PATTERNS FROM A NEW MODIFICATION OF CHROMIUM [J].
FORSSELL, J ;
PERSSON, B .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1969, 27 (05) :1368-&