Range studies of low-energy muons in a thin Al film

被引：3

作者：

Glückler, H

Morenzoni, E

Prokscha, T

Birke, M

Forgan, EM

Hofer, A

Jackson, TJ

Litterst, J

Luetkens, H

Niedermayer, C

Pleines, M

Riseman, TM

Schatz, G

机构：

[1] Paul Scherrer Inst, Lab Myonspinspektroskopie, CH-5232 Villigen, Switzerland

[2] Tech Univ Carolo Wilhelmina Braunschweig, Inst Met Phys & Nukl Festkorperphys, D-38106 Braunschweig, Germany

[3] Univ Birmingham, Sch Phys & Astron, Birmingham B15 2TT, W Midlands, England

[4] Univ Konstanz, Fak Phys, D-78457 Constance, Germany

来源：

PHYSICA B-CONDENSED MATTER | 2000年 / 289卷

基金：

英国工程与自然科学研究理事会;

关键词：

muon ranges; low-energy muons; low-energy mu SR;

D O I：

10.1016/S0921-4526(00)00304-5

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The range of low-energy mu(+) in a thin Al film deposited on a quartz glass substrate has been investigated as a function of the mu(+) implantation energy by measuring the amplitude of the diamagnetic signal in a transverse field experiment. The mu(+) implantation energy was varied between 3.4 and 29.4 keV. The mu(+) asymmetry, which reflects the fraction of mu(+) stopped in Al, is found to decrease with increasing energy. The results are compared and found in good agreement with predictions of a Monte Carlo program, which simulates the implantation profiles of muons in matter. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：658 / 661

页数：4

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