Low temperature growth of epitaxial graphene on SiC induced by carbon evaporation

被引:69
作者
Al-Temimy, A. [1 ]
Riedl, C. [1 ]
Starke, U. [1 ]
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
关键词
SURFACES;
D O I
10.1063/1.3265916
中图分类号
O59 [应用物理学];
学科分类号
摘要
Low temperature growth of epitaxial graphene on SiC is facilitated by carbon evaporation under ultrahigh vacuum (UHV) conditions. By counteracting the need for complete Si depletion as in the conventional sublimation method, monolayer graphene evolves at significantly lower temperatures by depositing additional carbon, so that a degradation of the initial SiC surface quality can be avoided. The original, well ordered terrace structure of SiC (0001) is preserved, the graphene layers grow on top and show the typical linear pi-band dispersion. On SiC(000 (1) over bar) the graphene lattice is rotated by 30 degrees in comparison to the conventional UHV preparation method. (C) 2009 American Institute of Physics. [doi: 10.1063/1.3265916]
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