共 10 条
[2]
Application of the footing effect in the micromachining of self-aligned, free-standing, complimentary metal-oxide-semiconductor compatible structures
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1999, 17 (04)
:2274-2279
[3]
Bhardwaj JK, 1995, P SOC PHOTO-OPT INS, V2639, P224, DOI 10.1117/12.221279
[4]
On the origin of the notching effect during etching in uniform high density plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1997, 15 (01)
:70-87
[6]
Deep silicon etching in inductively coupled plasma reactor for MEMS
[J].
PHYSICA SCRIPTA,
1999, T79
:250-254
[7]
Pattern shape effects and artefacts in deep silicon etching
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1999, 17 (04)
:2280-2285
[8]
LONG MK, 1998, P MICR SIM MOD MSM, P35
[9]
R BOSCH GMBH, Patent No. 4855017
[10]
R BOSCH GMBH, Patent No. 4784720