Initial stages of oxide formation on the Zr surface at low oxygen pressure: An in situ FIM and XPS study

被引:121
作者
Bespalov, I. [1 ]
Datler, M. [1 ]
Buhr, S. [1 ]
Drachsel, W. [1 ]
Rupprechter, G. [1 ]
Suchorski, Y. [1 ]
机构
[1] Vienna Univ Technol, Inst Mat Chem, A-1060 Vienna, Austria
基金
奥地利科学基金会;
关键词
Zirconium; Zirconia; Surface oxidation; X-Ray photoelectron spectroscopy; Field ion microscopy; RAY PHOTOELECTRON-SPECTROSCOPY; THERMAL-OXIDATION; CO OXIDATION; ZIRCONIUM; TEMPERATURE; KINETICS; SEGREGATION; MECHANISMS; GROWTH;
D O I
10.1016/j.ultramic.2015.02.016
中图分类号
TH742 [显微镜];
学科分类号
摘要
An improved methodology of the Zr specimen preparation was developed which allows fabrication of stable Zr nanotips suitable for FIM and AP applications. Initial oxidation of the Zr surface was studied on a Zr nanotip by FIM and on a polycrystalline Zr foil by XPS, both at low oxygen pressure (10(-8)-10(-7) mbar). The XPS data reveal that in a first, fast stage of oxidation, a Zr suboxide interlayer is formed which contains three suboxide components (Zr+1, Zr+2 and Zr+3) and is located between the Zr surface and a stoichiometric ZrO2 overlayer that grows in a second, slow oxidation stage. The sole suboxide layer has been observed for the first time at very early states of the oxidation (oxygen exposure <= 4 L). The Ne+ FIM observations are in accord with a two stage process of Zr oxide formation. (C) 2015 The Authors. Published by Elsevier B.V.
引用
收藏
页码:147 / 151
页数:5
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