Detection mechanism of an optical evanescent field using a noncontact mode atomic force microscope with a frequency modulation detection method

被引：10

作者：

Abe, M ^{[1
]}

Uchihashi, T ^{[1
]}

Ohta, M ^{[1
]}

Ueyama, H ^{[1
]}

Sugawara, Y ^{[1
]}

Morita, S ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN,DEPT ELECT ENGN,SUITA,OSAKA 565,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 04期

关键词：

D O I：

10.1116/1.589485

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

By using the noncontact atomic force microscope with a frequency modulation detection method, the force gradient induced by the optical evanescent field was detected in a high vacuum. We succeeded in measuring the exponential distance dependence of the force gradient induced by the optical evanescent field. Furthermore, we investigated the incident beam intensity and bias voltage dependence of the force gradient induced by the optical evanescent field. We confirmed that the detection mechanism is not photothermal effect but the surface photovoltage effect. (C) 1997 American Vacuum Society.

引用

页码：1512 / 1515

页数：4

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