Effect of N2 partial pressure on the microstructure and mechanical properties of magnetron sputtered CrNix films

被引：72

作者：

Han, ZH ^{[1
]}

Tian, JW ^{[1
]}

Lai, QX ^{[1
]}

Yu, XJ ^{[1
]}

Li, GY ^{[1
]}

机构：

[1] Jiao Tong Univ, State Key Lab MMCs, Shanghai 200030, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 162卷 / 2-3期

关键词：

magnetron sputtering; CrNx films; N-2 partial pressure; mechanical properties;

D O I：

10.1016/S0257-8972(02)00667-9

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this paper, Chromium nitride (CrNx) thin films were deposited with reactive magnetron sputtering method. EDX, X-ray diffraction and transmission electronic microscopy were employed to characterize their chemical compositions, phases and microstructures. Microhardness and elastic modulus were evaluated using a microhardness tester and the effect of N-2 partial pressure on the composition, phases, microstructure and mechanical properties of CrNx thin films was investigated. The results show that the phase formation of CrNx thin films varies from Cr+Cr2N to single-phase Cr2N, and then Cr2N+CrN to nearly single-phase CrN with increasing N-2 partial pressure. The microhardness values of these films make a distribution ranging from HV 21.4 to 27.1 GPa, and when the atom ratio of Cr:N is 1:2 and 1:1, thin film reaches peak hardness values (HV 27.1 and HV 26.8 GPa, respectively), while the elastic modulus is maximal (350 GPa) when single-phase Cr2N films is formed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：189 / 193

页数：5

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