Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

被引：78

作者：

Hu, XY ^{[1
]}

Cahill, DG

Averback, RS

机构：

[1] Univ Illinois, Dept Mat Sci, Urbana, IL 61801 USA

[2] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 22期

关键词：

D O I：

10.1063/1.126633

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 nm thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of > 2x10(14) initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, (similar to 2x10(16) cm(-2)), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts. (C) 2000 American Institute of Physics. [S0003-6951(00)02422-0].

引用

页码：3215 / 3217

页数：3

共 23 条

[1]

ANDERSEN HH, 1981, SPUTTERING PARTICLE, P186

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