Study of ion desorption induced by core-level excitations of condensed Si(CH3)(4) by using photoelectron-photoion coincidence spectroscopy (PEPICO) combined with synchrotron radiation

被引:10
作者
Mase, K [1 ]
Nagasono, M [1 ]
Tanaka, S [1 ]
Urisu, T [1 ]
Nagaoka, S [1 ]
机构
[1] EHIME UNIV,FAC SCI,DEPT CHEM,MATSUYAMA,EHIME 79077,JAPAN
关键词
Auger ejection; desorption induced by electronic transitions (DIET); photon stimulated desorption; tetramethylsilane; STIMULATED DESORPTION; EDGE;
D O I
10.1016/S0039-6028(96)01421-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photoelectron-photoion coincidence (PEPICO) spectra of condensed Si(CH3)(4) were measured with C 1s and the Si 2p photoelectrons using synchrotron radiation. H+ was found to be the only species desorbed in both cases. Furthermore, the H+ yield in coincidence with the C 1s photoemission was found to be three times as large as that with the Si 2p photoemission. These results indicate that the Auger-stimulated ion desorption mechanism is responsible for the H+ desorption, that the neutralization and recapture probabilities of the polyatomic ions are much larger than those of H+, and that the C 1s photoemission leads more efficiently to H+ desorption than the Si 2p photoemission.
引用
收藏
页码:376 / 379
页数:4
相关论文
共 15 条
[1]   ANGLE RESOLVED PHOTOELECTRON STUDY OF RESONANCES NEAR THE SI 2-PARA EDGE OF THE SI(CH3)4 MOLECULE [J].
DESOUZA, GGB ;
MORIN, P ;
NENNER, I .
JOURNAL OF CHEMICAL PHYSICS, 1985, 83 (02) :492-498
[2]   ADSORBATE CORE IONIZATION AS PRIMARY PROCESS IN ELECTRON-STIMULATED AND PHOTON-STIMULATED DESORPTION FROM METAL-SURFACES [J].
FRANCHY, R ;
MENZEL, D .
PHYSICAL REVIEW LETTERS, 1979, 43 (12) :865-867
[3]  
KNOTEK ML, 1985, SPRINGER SERIES SURF, V4, P77
[4]   Development of electron-ion coincidence spectroscopy for the study of surface dynamics [J].
Mase, K ;
Nagasono, M ;
Urisu, T ;
Murata, Y .
BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1996, 69 (07) :1829-1832
[5]  
MASE K, 1996, 23 UVSOR, P94
[6]  
MASE K, IN PRESS REV SCI INS
[7]   SELECTIVE RESONANT PHOTOIONIZATION PROCESSES NEAR THE SI 2P EDGE OF TETRAMETHYLSILANE [J].
MORIN, P ;
DESOUZA, GGB ;
NENNER, I ;
LABLANQUIE, P .
PHYSICAL REVIEW LETTERS, 1986, 56 (02) :131-134
[8]   Auger electron-ion coincidence study for H2O adsorbed on SiO2/Si(111) at 80 K [J].
Nagasono, M ;
Mase, K ;
Urisu, T .
SURFACE SCIENCE, 1996, 363 (1-3) :342-346
[9]  
NAGASONO M, 1996, IN PRESS UVSOR ACTIV, V23, P100
[10]  
NAGASONO M, 1996, 23 UVSOR, P104