Laser ablation thresholds of silicon for different pulse durations:: theory and experiment

The ultrafast laser ablation of silicon has been investigated experimentally and theoretically. The theoretical description is based on molecular dynamics (MD) simulations combined with a microscopic electronic model. We determine the thresholds of melting and ablation for two different pulse durations tau = 20 and 500 fs. Experiments have been performed using 100 Ti:Sapphire laser pulses per spot in air environment. The ablation thresholds were determined for pulses with a duration of 25 and 400 fs, respectively. Good agreement is obtained between theory and experiment. (C) 2002 Elsevier Science B.V. All rights reserved.