Phosphonic acid self-assembled monolayer and amorphous hafnium oxide hybrid dielectric for high performance polymer thin film transistors on plastic substrates

被引:30
作者
Acton, Orb [1 ]
Osaka, Itaru [2 ]
Ting, Guy [3 ]
Hutchins, Daniel [1 ]
Ma, Hong [1 ]
McCullough, Richard D. [2 ]
Jen, Alex K. -Y. [1 ,3 ]
机构
[1] Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA
[2] Carnegie Mellon Univ, Dept Chem, Pittsburgh, PA 15213 USA
[3] Univ Washington, Dept Chem, Seattle, WA 98195 USA
关键词
VOLTAGE ORGANIC TRANSISTORS; FIELD-EFFECT TRANSISTORS;
D O I
10.1063/1.3231445
中图分类号
O59 [应用物理学];
学科分类号
摘要
A vacuum-free solution processed hybrid dielectric composed of an n-octadecyl-phosphonic acid self-assembled monolayer on amorphous sol-gel processed hafnium oxide (HfO(x)) is demonstrated for low-voltage polymer semiconductor-based thin film transistors (TFTs). The phosphonic acid/HfO(x) hybrid dielectric provides high capacitance (0.41 mu F/cm(2)), low leakage current (5 x 10(-8) A/cm(2)), and is compatible with plastic substrates. The utility of this dielectric is demonstrated by fabricating high performance polymer TFTs based on a spin coated thiophene-thiazolothiazole copolymer with operating voltages under -2 V, negligible hysteresis, subthreshold slopes as low as 100 mV/dec, and hole mobilities up to 0.11 cm(2) V s. (C) 2009 American Institute of Physics. [doi: 10.1063/1.3231445]
引用
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页数:3
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