High-field step-stress and long term stability of PHEMTs with different gate and recess lengths

被引:3
作者
Cova, P [1 ]
Menozzi, R
Dammann, M
Feltgen, T
Jantz, W
机构
[1] Univ Parma, Dipartimento Ingn Informazione, Parco Area Sci 181-A, I-43100 Parma, Italy
[2] Fraunhofer Inst Appl Solid State Phys, D-79108 Freiburg, Germany
关键词
D O I
10.1016/S0026-2714(02)00195-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reliability of high power AlGaAs/InGaAs/GaAs PHEMTs has been investigated. The influences of high temperature and of elevated drain voltage have been studied separately, using long term operation at elevated temperature and a 23-hour drain-voltage step-stress at room temperature. Results pertaining to different combinations of gate length and gate-drain ledge are reported and discussed, indicating safe operation values and showing that a wider gate-drain recess increases the device reliability. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1587 / 1592
页数:6
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