Initial stages of Ge growth on Si(100): ad-atoms, ad-dimers, and ad-trimers

被引:8
作者
Dalpian, GM [1 ]
Janotti, A [1 ]
Fazzio, A [1 ]
da Silva, AJR [1 ]
机构
[1] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil
基金
巴西圣保罗研究基金会;
关键词
Ge on Si(100); semiconductor growth; ab initio calculations;
D O I
10.1016/S0921-4526(99)00580-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We study, using ab initio calculations, small structures that are present at the early stages of growth of Ge on the Si(100) surface. Ad-atoms, ad-dimers, and ad-trimers are investigated. We consider different configurations of the adsorbed structures, and present results for their relaxed geometries and relative energies. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:589 / 592
页数:4
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